Title of article :
A New Approach to Abstracting AltPSM Lithography Requirements for IC Design Domains
Author/Authors :
Pradiptya Ghosh ، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2005
Keywords :
alternating phase shift mask , resolution enhancement technique , Physical design , design rule checking , sub-wavelength process
Journal title :
Analog Integrated Circuits and Signal Processing
Journal title :
Analog Integrated Circuits and Signal Processing
