مرکز منطقه ای اطلاع رساني علوم و فناوري - Surface dynamics on a high-temperature Si surface under a high-pressure reactive gas atmosphere studied by time-resolved UPS

Title of article :

Surface dynamics on a high-temperature Si surface under a high-pressure reactive gas atmosphere studied by time-resolved UPS

Author/Authors :

Yuji Takakuwa، نويسنده ,

Issue Information :

روزنامه با شماره پیاپی سال 1999

Pages :

From page :

211

To page :

221

Keywords :

Si gas-phase process , Surface dynamics , In situ observation , Si adatom , Gas source molecular beam epitaxy , Oxidation , Time-resolved ultraviolet photoelectron spectroscopy , Etching

Journal title :

JOURNAL OF ELECTRON SPECTROSCOPY & RELATED PHENOMENA

Serial Year :

1999

Journal title :

JOURNAL OF ELECTRON SPECTROSCOPY & RELATED PHENOMENA

Record number :

379257

Link To Document :

https://search.isc.ac/dl/search/defaultta.aspx?DTC=10&DC=379257