مرکز منطقه ای اطلاع رساني علوم و فناوري - Effects of elastic-electron scattering on measurements of silicon dioxide film thicknesses by X-ray photoelectron spectroscopy

Title of article :

Effects of elastic-electron scattering on measurements of silicon dioxide film thicknesses by X-ray photoelectron spectroscopy

Author/Authors :

C. J. Powell and A. Jablonski، نويسنده ,

Issue Information :

روزنامه با شماره پیاپی سال 2001

Pages :

From page :

1139

To page :

1143

Keywords :

Effective attenuation length , Film thickness , Silicon dioxide , Elastic Scattering , XPS

Journal title :

JOURNAL OF ELECTRON SPECTROSCOPY & RELATED PHENOMENA

Serial Year :

2001

Journal title :

JOURNAL OF ELECTRON SPECTROSCOPY & RELATED PHENOMENA

Record number :

379633

Link To Document :