Title of article
Use of angle-resolved XPS to determine depth profiles based on Fick’s second law of diffusion: description of method and simulation study
Author/Authors
Jie Diao and Dennis W. Hess، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2004
Pages
18
From page
87
To page
104
Keywords
Angle-resolved X-ray photoelectron spectroscopy (ARXPS) , diffusion , depth profile
Journal title
JOURNAL OF ELECTRON SPECTROSCOPY & RELATED PHENOMENA
Serial Year
2004
Journal title
JOURNAL OF ELECTRON SPECTROSCOPY & RELATED PHENOMENA
Record number
379958
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