Title of article
Characterization and degradation of ZEP520 resist film by TOF-PSID and NEXAFS
Author/Authors
H. Ikeura-Sekiguchi، نويسنده , , T. Sekiguchi and M. Koike، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2005
Pages
3
From page
453
To page
455
Keywords
Resist , X-ray lithography , Inner-shell excitation , Time-of-flight , synchrotron radiation , desorption
Journal title
JOURNAL OF ELECTRON SPECTROSCOPY & RELATED PHENOMENA
Serial Year
2005
Journal title
JOURNAL OF ELECTRON SPECTROSCOPY & RELATED PHENOMENA
Record number
380332
Link To Document