Title of article
Technical Note: Concepts for protection of EUVL masks from particle contamination
Author/Authors
Christof Asbach، نويسنده , , F. Einar Kruis and Heinz Fissan، نويسنده , , Jung Hyeun Kim، نويسنده , , Se-Jin Yook ، نويسنده , , David Y. H. Pui ، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2006
Pages
4
From page
705
To page
708
Keywords
EUVL mask , Nanoelectronics , Thermophoresis , electrophoresis , nanoparticle contamination
Journal title
Journal of Nanoparticle Research
Serial Year
2006
Journal title
Journal of Nanoparticle Research
Record number
390377
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