Title of article :
Polysilanes for semiconductor fabrication
Author/Authors :
Shuzi Hayase، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2003
Pages :
23
From page :
359
To page :
381
Keywords :
lithography , Resist , bilayer , Amplification , Benzophenone , Electron transfer , Anti-reflection , Patterntransfer , Photo-reactivity , Polysilane
Journal title :
Progress in Polymer Science
Serial Year :
2003
Journal title :
Progress in Polymer Science
Record number :
390840
Link To Document :
https://search.isc.ac/dl/search/defaultta.aspx?DTC=10&DC=390840
