Author/Authors :
Yiming Li، نويسنده , , Hung-Mu Chou، نويسنده , , Jam-Wem Lee، نويسنده ,
Keywords :
three-dimensional (3-D) simulation , device structure , subthresholdswing (SS) , Nanowire , turn-on resistance. , Fabrication , nanodevice , omega-shaped-gate , on/off ratio , fin field-effect transistor (FinFET) , gate capacitance , surrounding gate , Coverage ratio , process technique , quantum correction model , Semiconductor devices