An atomic force microscope study of surface roughness of thin silicon films deposited on SiO/sub 2/

Nasrullah، نويسنده , , J.، نويسنده , , Tyler، نويسنده , , G.L.، نويسنده , , Nishi، نويسنده , , Y.، نويسنده ,

روزنامه با شماره پیاپی سال 2005

9

303

311

thin-film deposition , three-dimensional (3-D) fabrication. , thin-film transistors , Amorphous semiconductors , Atomic force microscopy , evaporated silicon , device stacking , low-pressure , chemically-vapor-deposited (LPCVD) , semiconductor films , Silicon , silicon on insulator technology , Smoothing methods , surfacecleaning , surface smoothness

IEEE Transactions on Nanotechnology

2005

IEEE Transactions on Nanotechnology

398732