A numerical study on airflow and dynamic cross-contamination in the super cleanroom for photolithography process

We performed the numerical study on the characteristics of airflow and cross-contamination in the photolithography process cleanroom. The nonuniformity, the deflection angle and the global cross-contamination were used to analyze the characteristics and performances of cleanroom. From the numerical results, we found that the airflow characteristics of the cleanroom are largely affected by the porosity of the access panel and adjustment of dampers and the cross-contamination varies with the location of source and the passage of time through the concentration ratio.