hermal characteristics of a high heat flux micro-evaporator

Our purpose is to design a high heat flux micro-evaporator that can remove more than 100 W/cm2. For this purpose a thin liquid film is evaporized. The liquid film is stabilized in micro-channels by capillary forces. The micro-channels are fabricated by chemical etching on silicon to reduce thermal resistance. For the experiments, the channel plate is heated by an ITO thin film heater deposited on the opposite side of the channel plate. Influence of heat flux, coolant flow rate, and inlet temperature on the temperature of the heater element are investigated. Water is used as working fluid. A maximal heat flux of 125 W/cm2 could be achieved for water inlet temperature of 90 °C and flow rate of 1.0 mL/min. The temperature of the heater element is kept constant at about 120 °C with fluctuations within 8 °C. The measured pressure drop is less than 1000 Pa.