Title of article :
MOSFET Mismatch Modeling: A New Approach
Author/Authors :
Hamilton Klimach، نويسنده , , Federal University of Rio Grande do Sul Carlos Galup-Montoro، نويسنده , , Federal University of Santa Catarina M?rcio C. Schneider، نويسنده , , Federal University of Santa Catarina Alfredo Arnaud، نويسنده , , Catholic University of Uruguay ، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2006
Pages :
10
From page :
20
To page :
29
Abstract :
Digital and analog ICs generally rely on the concept of matched behavior between identically designed devices. Time-independent variations between identically designed transistors, called mismatch, affect the performance of most analog and even digital MOS circuits. This article focuses on the analysis of mismatch in MOS transistors resulting from random fluctuations of the dopant concentration, first studied by Keyes. Today, we recognize these fluctuations as the main cause of mismatch in bulk CMOS transistors.
Journal title :
IEEE Design and Test of Computers
Serial Year :
2006
Journal title :
IEEE Design and Test of Computers
Record number :
431635
Link To Document :
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