Title of article :
Electrochemical property of tin oxide thin film by photo-CVD process
Author/Authors :
Hironori Kobayashi، نويسنده , , Yasushi Uebou، نويسنده , , Tadashi Ishida، نويسنده , , Shigeharu Tamura، نويسنده , , Shoichi Mochizuki، نويسنده , , Toshiyuki Mihara، نويسنده , , Mitsuharu Tabuchi، نويسنده , , Hiroyuki Kageyama، نويسنده , , Yoshifumi Yamamoto، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2001
Pages :
3
From page :
229
To page :
231
Abstract :
The tin oxide (SnO2) films were prepared by a photo-CVD process and characterized by X-ray diffraction (XRD) and electrochemical measurements. The SnO2 films prepared at 473 and 523 K showed amorphous-like hallow pattern, while the SnO2 film prepared at 573 K showed a poor crystalline pattern. All the Li/SnO2 cells showed the reversible capacity of 600 mAh/g in the voltage range of 0.1–0.8 V over 200 cycles. It was clarified that the SnO2 film showing superior electrochemical performance was prepared at low temperature of 473 K using TMT (Sn(CH3)4) and O2 (containing 4 mol.% O3) as the source material.
Keywords :
Tin oxide films , Low temperature preparation , Photo-CVD
Journal title :
Journal of Power Sources
Serial Year :
2001
Journal title :
Journal of Power Sources
Record number :
440573
Link To Document :
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