• Title of article

    Hemocompatibility of titanium oxide films

  • Author/Authors

    N. Huang، نويسنده , , P. Yang، نويسنده , , Y. X. Leng، نويسنده , , J. Y. Chen and W. Q. Pu، نويسنده , , H. Sun، نويسنده , , J. Wang، نويسنده , , G. J. Wang، نويسنده , , P. D. Ding، نويسنده , , T. F. Xi، نويسنده , , Y. Leng، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2003
  • Pages
    11
  • From page
    2177
  • To page
    2187
  • Abstract
    Hemocompatibility is a key property of biomaterials that come in contact with blood. Surface modification has shown great potential for improving the hemocompatibility of biomedical materials and devices. In this paper, we describe our work of improving hemocompatibility with Ti–O thin films prepared by plasma immersion ion implantation and deposition and by sputtering. The structure and surface chemical and physical properties of the films were characterized by X-ray diffraction, Auger electron spectroscopy, atomic force microscopy (AFM), contact angle measurement, and Hall effect measurement. The behavior of fibrinogen adsorption was investigated by 125I radioactive isotope labeling and AFM. Systematic evaluation of hemocompatibility, including in vitro clotting time, thrombin time, prethrombin time, platelet adhesion, and in vivo implantation into dogʹs ventral aorta or right auricle from 17 to 90 days, proved that Ti–O films have excellent hemocompatibility. It is suggested that the significantly lower interface tension between Ti–O films and blood and plasma proteins and the semiconducting nature of Ti–O films give them their improved hemocompatibility.
  • Keywords
    Titanium oxide film , Hemocompatibility , N-type semiconductor , interface tension
  • Journal title
    Biomaterials
  • Serial Year
    2003
  • Journal title
    Biomaterials
  • Record number

    544844