Title of article :
Hemocompatibility of titanium oxide films
Author/Authors :
N. Huang، نويسنده , , P. Yang، نويسنده , , Y. X. Leng، نويسنده , , J. Y. Chen and W. Q. Pu، نويسنده , , H. Sun، نويسنده , , J. Wang، نويسنده , , G. J. Wang، نويسنده , , P. D. Ding، نويسنده , , T. F. Xi، نويسنده , , Y. Leng، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2003
Abstract :
Hemocompatibility is a key property of biomaterials that come in contact with blood. Surface modification has shown great potential for improving the hemocompatibility of biomedical materials and devices. In this paper, we describe our work of improving hemocompatibility with Ti–O thin films prepared by plasma immersion ion implantation and deposition and by sputtering. The structure and surface chemical and physical properties of the films were characterized by X-ray diffraction, Auger electron spectroscopy, atomic force microscopy (AFM), contact angle measurement, and Hall effect measurement. The behavior of fibrinogen adsorption was investigated by 125I radioactive isotope labeling and AFM. Systematic evaluation of hemocompatibility, including in vitro clotting time, thrombin time, prethrombin time, platelet adhesion, and in vivo implantation into dogʹs ventral aorta or right auricle from 17 to 90 days, proved that Ti–O films have excellent hemocompatibility. It is suggested that the significantly lower interface tension between Ti–O films and blood and plasma proteins and the semiconducting nature of Ti–O films give them their improved hemocompatibility.
Keywords :
Titanium oxide film , Hemocompatibility , N-type semiconductor , interface tension
Journal title :
Biomaterials
Journal title :
Biomaterials