Title of article :
Time-of-flight photoelectron spectroscopy of atoms and molecules
Author/Authors :
W.a، Lindle, Dennis نويسنده , , A.a، Hemmers,Oliver نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2001
Pages :
-26
From page :
27
To page :
0
Abstract :
Following the advent of third-generation synchrotron-radiation sources with ultra-high brightness and X-ray pulse widths of a few picoseconds, the technique of time-of-flight (TOF) electron spectroscopy has experienced a dramatic enhancement in energy resolution. Using soft-X-ray beams focused to 100 ?m or less, a new gas-phase TOF-photoelectron apparatus in operation at the Advanced Light Source (ALS) has demonstrated electron energy resolution as high as 8000 (E/?E), comparable to some of the best electrostatic analyzers, while maintaining the traditional efficiency of the TOF technique. This apparatus is being used to probe limitations of basic approximations in X-ray photoemission: (1) the independent-particle approximation, and (2) the dipole approximation. In both cases, new limits of these approximations have been discovered in unexpected photon-energy regimes. This paper includes an overview of the TOF technique as well as a summary of results from the ALS on limits of these basic approximations.
Keywords :
structural properties , Transition metal/rare earth metal bilayers
Journal title :
JOURNAL OF ALLOYS AND COMPOUNDS
Serial Year :
2001
Journal title :
JOURNAL OF ALLOYS AND COMPOUNDS
Record number :
59225
Link To Document :
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