Author/Authors :
Gullikson، Eric M. نويسنده , , Grantham، Steven نويسنده , , Bajt، Sasa نويسنده , , Chapman، Henry N. نويسنده , , Nguyen، Nhan نويسنده , , Alameda، Jennifer نويسنده , , Robinson، Jeffrey C. نويسنده , , Malinowski، Michael نويسنده , , Aquila، Andrew نويسنده , , Tarrio، Charles نويسنده ,
Abstract :
Multilayer lifetime has emerged as one of the major issues for the commercialization of extreme-ultraviolet lithography (EUVL). We describe the performance of an oxidation-resistant capping layer of Ru atop multilayers that results in a reflectivity above 69% at 13.2 nm, which is suitable for EUVL projection optics and has been tested with accelerated electron-beam and extreme-ultraviolet (EUV) light in a water-vapor environment. Based on accelerated exposure results, we calculated multilayer lifetimes for all reflective mirrors in a typical commercial EUVL tool and concluded that Ru-capped multilayers have ~40 * longer lifetimes than Si-capped multilayers, which translates to 3 months to many years, depending on the mirror dose
