Title of article
Linearity and sensitivity of MIS position sensitive detectors
Author/Authors
H. ´A GUAS?، نويسنده , , L. PEREIRA، نويسنده , , D. COSTA، نويسنده , , E. Fortunato، نويسنده , , R. MARTINS، نويسنده ,
Issue Information
دوهفته نامه با شماره پیاپی سال 2005
Pages
5
From page
1377
To page
1381
Abstract
The linearity and sensitivity of linear Position Sensitive Detectors (PSD) are the two
principal characteristics of sensors to be optimised in sensor fabrication. This work presents
several efforts made to understand the internal and external parameters that influence the
linearity and sensitivity of Metal Insulator Semiconductor (MIS) linear PSD with an active
length of 6 cm. The use of long sensitive areas allows the PSD to achieve greater resolution
without the need of a highly accurate light spot integration mechanism. The PSD is built in
a multi-layered structure consisting of Cr/a-Si:H (n+ doped)/a-Si:H (intrinsic)/SiOx
(passivation layer)/Au, where the active a-Si:H layers were deposited by Modified Triode
Plasma Enhanced Chemical Vapour Deposition (MTPECVD), which allows the deposition of
good electronic grade material with a low (≈1×1015 cm−3) defect density inferred by CPM.
The sensor linearity and sensitivity shows dependence on the sensor width to length ratio,
SiOx layer and on the value of the load resistance. Sensitivities of more than 30 mV/cm
were achieved with linearity near 99%. Besides that, this type of MIS structure allows an
improved spectral response in the near-UV region and has its maximum response at
540 nm. C 2005 Springer Science + Business Media, Inc.
Journal title
Journal of Materials Science
Serial Year
2005
Journal title
Journal of Materials Science
Record number
829635
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