Author/Authors :
M. Segarra، نويسنده , , M. MARTI´NEZ، نويسنده , , M. A. FERNA´ NDEZ، نويسنده , , J. M. Chimenos، نويسنده , , F. Espiell، نويسنده , , N. SIRVENT، نويسنده , , O. GUIX `A، نويسنده ,
Abstract :
During the annealing process of cold-drawn copper with small amounts of impurities a
multiple-sigmoidal behavior has been found, related to the overlapping of two or more
process steps, corresponding to a simultaneous recrystallization of the copper matrix and
the impurities placement processes. A kinetic equation is introduced to describe the overall
process by means of an auto-catalytic kinetic model which could also be extended to
describe any annealing process presenting a multi-sigmoidal character.
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