• Title of article

    Dynamics of STO heteroepitaxial growth by pulsed laser deposition

  • Author/Authors

    X. Z. Liu، نويسنده , , S. M. HE، نويسنده , , D. H. LI، نويسنده , , Q. F. LU، نويسنده , , Z. H. WANG، نويسنده , , S. X. BAO، نويسنده , , Y. R. Li، نويسنده ,

  • Issue Information
    دوهفته نامه با شماره پیاپی سال 2005
  • Pages
    7
  • From page
    5139
  • To page
    5145
  • Abstract
    The heteroepitaxial growth dynamics of STO thin films on (100) LaAlO3 substrate by pulsed laser deposition has been studied. The laser energy density was found to be an important factor to determine the growth mechanics. High laser energy density is benefit to two dimensional layer-by-layer growth. Island growth prevails at low substrate temperature. STO thin films deposited at low oxygen partial pressure showed pellicular square grains. High oxygen partial pressure resulted in spherical STO grains. Step-terrace on substrate surface acts as a preferential nucleation site for adatoms, which leads to step-flow growth. STO thin films with atomic flat surface has been prepared on step-terraced substrate. C 2005 Springer Science + Business Media, Inc.
  • Journal title
    Journal of Materials Science
  • Serial Year
    2005
  • Journal title
    Journal of Materials Science
  • Record number

    830266