Title of article :
Microstructure development and nonlinear electrical characteristics of the SnO2·CuO·Ta2O5 based varistors
Author/Authors :
CHUN-MING WANG?، نويسنده , , Jinfeng Wang، نويسنده , , WEN-BIN SU، نويسنده , , HONG-CUN CHEN، نويسنده , , GUO-ZHONG ZANG، نويسنده , , PENG QI، نويسنده ,
Issue Information :
دوهفته نامه با شماره پیاپی سال 2005
Pages :
4
From page :
6459
To page :
6462
Abstract :
The microstructure development of SnO2·CuO based ceramic material was analyzed by XRD and SEM and the electrical properties were investigated by J-E relation. The secondary phases of copper oxide were found by the XRD. Copper oxide could make tin oxide densify and advance the grain growth, while tantalum oxide would retard the grain growth. Excess copper would centralize at the grain boundaries and prevent the mass transport. The high nonlinear coefficient (α = 27.3) and low leakage current density (JL = 16 μA cm−2) for the 0.05 mol% Ta2O5-doped SnO2·CuO based varistor sample were obtained. The modified defect barrier model for CuO and Ta2O5-doped SnO2 based varistors was introduced. C 2005 Springer Science + Business Media, Inc.
Journal title :
Journal of Materials Science
Serial Year :
2005
Journal title :
Journal of Materials Science
Record number :
830465
Link To Document :
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