Title of article
Preparation of complex oxide thin films under hydrothermal and hydrothermal-electrochemical conditions
Author/Authors
K. KAJIYOSHI، نويسنده , , K. Yanagisawa، نويسنده , , Q. FENG، نويسنده , , M. Yoshimura، نويسنده ,
Issue Information
دوهفته نامه با شماره پیاپی سال 2006
Pages
6
From page
1535
To page
1540
Abstract
Thin-film growth of complex oxides including BaTiO3, SrTiO3, BaZrO3, SrZrO3, KTaO3, and
KNbO3 were studied by the hydrothermal and the hydrothermal-electrochemical methods.
Hydrothermal-electrochemical growth of ATiO3 (A = Ba, Sr) thin films was investigated at
temperatures from 100◦ to 200◦C using a three-electrode cell. Current efficiency for the film
growth was in the range from ca. 0.6% to 3.0%. Tracer experiments revealed that the ATiO3 film
grows at the film/substrate interface. AZrO3 (A = Ba, Sr) thin films were also prepared on Zr
metal substrates by the hydrothermal-electrochemical method. By applying a potential above
ca. +2 V vs. Ag/AgCl to the Zr substrates, AZrO3 thin films were formed uniformly. KMO3 (M = Ta, Nb) thin films were prepared on Ta metal substrates by the hydrothermal method.
Perovskite-type KTaO3 thin films were formed in 2.0 M KOH at 300◦C. Pyrochlore-type K2Ta2O6
thin films were formed at lower temperatures and lower KOH concentrations. Morphotropic
phase changes were also revealed in the hydrothermal system KTaO3-KNbO3.
C 2006 Springer Science + Business Media, Inc
Journal title
Journal of Materials Science
Serial Year
2006
Journal title
Journal of Materials Science
Record number
830661
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