Title of article :
Mechanical properties of electrodeposited nanocrystalline copper
using tensile and shear punch tests
Author/Authors :
Ramesh Kumar Guduru، نويسنده , , Kristopher A. Darling، نويسنده , , Ronald O. Scattergood، نويسنده , , Carl C. Koch، نويسنده , ,
K. L. Murty، نويسنده ,
Issue Information :
دوهفته نامه با شماره پیاپی سال 2007
Abstract :
Characterization of the mechanical properties
of electrodeposited nanocrystalline Cu with an average
grain size of 74 nm was carried out using two different
testing techniques, shear punch tests and tensile tests. The
grain size distribution was broad and the volume fraction of
larger grains was appreciable. The electrodeposited Cu had
a high yield strength combined with moderate ductility and
strain hardening. Scatter in the ductility values was
attributed to residual porosity and inhomogeneity in the
microstructure. Measurements of the strain rate sensitivity
showed a significant increase in the rate sensitivity and a
decrease in the activation volume for the deformation of
nanocrystalline Cu compared with similar tests on coarsegrained
cold worked Cu
Journal title :
Journal of Materials Science
Journal title :
Journal of Materials Science