Author/Authors :
S. Briche، نويسنده , , D. Riassetto، نويسنده , , C. Gastaldin، نويسنده , , C. Lamarle، نويسنده , , O. Dellea، نويسنده , ,
D. Jamon، نويسنده , , E. Pernot، نويسنده , , M. Labeau، نويسنده , , G. Ravel، نويسنده , , M. Langlet، نويسنده ,
Abstract :
Sol–gel processed photosensitive hybrid
organic–inorganic films, deposited from 2-(3,4-epoxycyclohexylethyltrimethoxysilane)
(EETMOS), have been
studied. EETMOS sols have been optimized with respect to
several criteria that guarantee a good quality, photosensitivity,
and reproducibility of derived films. Photo-sensitivity
of EETMOS-based films has been assessed by UVA exposure
experiments. Optimized films have been photopatterned
using a mercury lamp or a He–Cd laser source,
both emitting in theUVAspectral range. Promising micronic
size motives have been laser patterned. The quality of
derived motives is discussed with respect to photopolymerization
mechanisms and photo-patterning parameters.
