Study of the submonolayer deposition by mean field lattice gas model

We study the early-time morphology and the scaling behavior of the interfaces generated by the deposition, diffusion and aggregation processes. The description of the kinetics is based on the mean field master equation in terms of lattice gas model. The results show that the islands morphology depends on the ratio D/F where D is the diffusion constant and F is the flux of the deposited atoms. In the low temperatures regime, the observed islands present a fractal geometry. However, in the height temperatures regime the atoms have enough time to rearrange on the edge of the island increasing the number of neighbors. This process results in more compact clusters.