A model for monolayer deposition with interacting particles

We present a very versatile three-dimensional growth model with random initial conditions for the deposition of a monolayer of particles out of a gas beam on a substrate. The flexibility of the model is guaranteed by the inclusion of parameters like the substrate temperature and the chemical binding whose variation changes strongly the lateral diffusion and the morphology of the developing disordered structure. In the modelling of the potential we can use in principle data coming from experiment and quantum mechanical computations. The use of short-range potentials allows to apply the model to covalent systems. We find a variety of patterns which resemble structures found in the experiment and in other theoretical models. The important parameters have simple physical and chemical interpretations, whereas the simulation of static properties may be done with more complicated potentials for specific materials. Our approach allows to look for particular growth conditions and dynamical processes of large structures with moderate use of computational resources.