Effects of measurement distance on measurements of symmetrically shaped patterns generated by line sources

Symmetrically shaped patterns, generated by real continuous linear apertures derived from Taylor distributions, resemble Taylor sum patterns in regard to the distance-dependence of their sidelobe heights. Their ripple shows negligible near-field degradation. If the aperture distribution is complex, however, the ripple and sidelobe levels show previously unreported degradation behavior, including a lowering of the first sidelobe level.