Fractal pattern growth simulation in electrodeposition and study of the shifting of center of mass

We presented simulation of fractal pattern in electrodeposition (Diffusion limited aggregation) using concept of off lattice walk. It is seen that the growth patterns are based on a parameter called ‘bias’. This parameter ‘bias’ controls the growth of patterns similar to that of electric field in electrodeposition technique. In present study the fractal patterns are grown for different values of ‘bias’. Dendritic patterns grown at lower value of ‘bias’ comprises open structure and show limited branching. As the bias is increased the growth tends to be dense and show more crowded branching. Box counting was implemented to calculate fractal dimension. The structural and textural complexities and are compared with the experimental observations. It was also noted that in the evolution of DLA patterns, the center of mass of the growth is shifted slightly. We tracked the position of the center of mass of simulated electro deposits under different electric field conditions. The center of mass exhibit random walk like patterns and it wanders around the origin or the starting point of the growth.