Analysis of the chemical vapor infiltration process computational experiments

A model for chemical vapor infiltration is analyzed. Consider a cylindrical pore with a reacting and carrier gas flowing in from the left. The gas reacts with the interior of the pore and the result is a solid matrix. The model assumes that the flux due to binary diffusion is negligible. The model also assumes that the reactions are first order. Numerically, we look at how the void and the concentration of reacting gas change as a function of space and time. We examine the progress of the process as α2 (proportional to reaction rate/diffusion rate) and the flux of the reactant out of the preform vary. We also compare the asymptotic analysis with the computational results.