Author/Authors :
Jie Liu a، نويسنده , , b، نويسنده , , Bangwu Liu، نويسنده , , Zenan Shen، نويسنده , , Jinhu Liu a، نويسنده , , Sihua Zhong a، نويسنده , , Gui-su Liu، نويسنده , , Chaobo Li، نويسنده , , Yang Xia، نويسنده , , ?، نويسنده ,
Abstract :
Optimized textured structure is one of the most important elements for high efficiency multicrystalline silicon solar cells. In this paper,
in order to incorporate low reflectance nanostructures into conventional industrial solar cells, structures with aspect ratios of about 1:1
and average reflectance of 8.0% have been generated using plasma immersion ion implantation. A sheet resistance of 56.9 X/sq has been
obtained by adjusting the phosphorous diffusion conditions, while the thickness of the silicon nitride vary in 70–80 nm by extending
the deposition time by 100 s. Under the conventional co-firing conditions, a solar cell with efficiency of 16.3% and short-circuit current
density 34.23 mA/cm2 has been fabricated.
2012 Elsevier Ltd. All rights reserved.
Keywords :
Plasma immersion ion implantation , Nanostructures , Multicrystalline silicon solar cells , electrical parameters
