Title of article :
Surface statistical properties of ZnO thin films produced by magnetron sputtering at different rates
Author/Authors :
Mirzaee، M. نويسنده Department of Horticulture, College of Agriculture, Tarbiat Modares University, Tehran, Iran. Mirzaee, M. , Zendehnam,، A. نويسنده Associate Professor of Physics at Arak University, , , Miri، S. M. نويسنده Department of Horticulture, Karaj Branch Islamic Azad University, Karaj, Iran ,
Issue Information :
دوفصلنامه با شماره پیاپی 63 سال 2013
Pages :
5
From page :
1071
To page :
1075
Abstract :
Nano layers of zinc, which were deposited by magnetron sputtering on Si (100) substrate, thermal oxidation exposed to the air at 400 ,C, were employed to produce ZnO thin films. In order to study the influence of the deposition rate on surface morphology, samples with different deposition rates (1.24.5 nm/s) were produced. The surface characteristics of these ZnO thin films are then evaluated against data which result from Atomic Force Microscopy (AFM). The results demonstrate that the film deposited with higher rates has higher surface roughness and grain size. The fractal analysis illustrates that the roughness exponents ( ) for all samples are close.
Journal title :
Scientia Iranica(Transactions F: Nanotechnology)
Serial Year :
2013
Journal title :
Scientia Iranica(Transactions F: Nanotechnology)
Record number :
944713
Link To Document :
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