Title of article :
Transversal-readout architecture for CMOS active pixel image sensors
Author/Authors :
S.، Miyatake, نويسنده , , T.، Morimoto, نويسنده , , Y.، Masaki, نويسنده , , K.، Ishida, نويسنده , , M.، Miyamoto, نويسنده , , H.، Tanabe, نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2003
Abstract :
Novel architecture for CMOS active pixel image sensors (APSs), which eliminates the vertically striped fixed pattern noise (FPN), is presented. There are two kinds of FPN for CMOS APSs. One originates from the pixel-to-pixel variation in dark current and sourcefollower threshold voltage, and the other from the column-to-column variation in column readout structures. The former may become invisible in the future due to process improvements. However, the latter, which results in a vertically striped FPN, is and will be conspicuous without some subtraction because of the correlation in the vertical direction. The pixel consists of a photodiode, a row- and column-reset transistor, a source-follower input transistor, and a column-select transistor instead of the row-select transistor found in conventional CMOS APSs. The column-select transistor is connected to a signal line that runs horizontally instead of vertically. An experimentally fabricated 320*240-pixel CMOS APS employing the transversal-readout architecture exhibited neither vertically nor horizontally striped FPN. A buried-photodiode device with the transversal-readout architecture is also proposed.
Keywords :
Biotechnology R&D , Industrial organization
Journal title :
IEEE TRANSACTIONS ON ELECTRON DEVICES
Journal title :
IEEE TRANSACTIONS ON ELECTRON DEVICES