Author/Authors :
Ricardo Izquierdo، نويسنده , , Joan Bertomeu، نويسنده , , Marc Suys، نويسنده , , Edward Sacher، نويسنده , , Michel Meunier، نويسنده ,
Abstract :
Copper films have been deposited on TiN and fluoropolymer substrates from the KrF excimer-laser-assisted decomposition of Cu(hfac)(TMVS). Using H2 as the carrier gas, very uniform, shiny metal-like films were deposited with grain size of 50 to 100 nm. XPS measurements show that the precursor is reduced to metallic copper, and that a Cu/C atomic ratio of up to 17 is obtained.
