The influence of the substrate material on the growth of V2O5 flash-evaporated films
Author/Authors :
C. Julien، نويسنده , , J.P. Guesdon، نويسنده , , A. Gorenstein، نويسنده , , A. Khelfa، نويسنده , , I. Ivanov، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1995
Pages :
3
From page :
389
To page :
391
Abstract :
The influence of the substrate material on the growth of V2O5 flash-evaporated films has been studied by Raman scattering spectroscopy. The highest quality films were grown on silicon substrate maintained at 25°C and annealed at 450°C in Ar atmosphere.
