• Title of article

    Model calculations on a bipolar transistor emitter interconnection with different contact shapes

  • Author/Authors

    K. Weide، نويسنده , , J. Ullmann، نويسنده , , W. Hasse، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 1995
  • Pages
    5
  • From page
    234
  • To page
    238
  • Abstract
    An emitter interconnection including the tungsten-filled contacts of a bipolar transistor was investigated for Al/Si/Cu and copper as metallization material. The dependence of local heating and maximum mass flux divergence on the length of the contacts and the distance between the contacts as well as the length of the metallization between the interconnect and the first contact was determined by finite element simulations. Out of the simulations the optimized geometry was determined. It is shown that copper compared to aluminum as metallization material can lead to a higher reliability of power elements. The optimization of the metallization and contact geometry can avoid high mass flux divergences and leads to a higher reliability.
  • Journal title
    Applied Surface Science
  • Serial Year
    1995
  • Journal title
    Applied Surface Science
  • Record number

    990279