Glow discharge sputtering deposition of thin films of Ag, Cr, Cu, Ni, Pd, Rh and their binary alloys onto NaCl and MgO Experimental parameters and epitaxy

The experimental conditions to condense epitaxial films of Ag, Cr, Cu, Ni, Pd, Rh, AgPd, CuPd and CuRh on MgO(100) and NaCl(100) by glow discharge sputtering are reported. The films are characterized by THEED, RHEED, SAD, TEM, ICP and AES. The effect of the substrate, the temperature and the target composition on the films obtained is examined and discussed. Perfect parallel epitaxy ((001)[110]d⊥(100)[110]s) was observed for all systems studied, except for AgMgO.