Author/Authors :
J.M. Moison، نويسنده , , L. Leprince، نويسنده , , F. Barthe ، نويسنده , , F. Houzay، نويسنده , , N. Lebouché، نويسنده , , J.M. Gérard، نويسنده , , J.Y. Marzin، نويسنده ,
Abstract :
Spontaneous patterning of strained deposits can be put to use for fabricating quantum dots. We evaluate this technique in the case of InAsGaAs. It is shown that the requirements for optoelectronic devices (dot size, homogeneity, optical yield, etc.) are nearly met but that further progresses will be needed before actual atomic-scale engineering can be realized.