Improvement of the crystallinity in PbTiO3 films grown on indium tin oxide-coated glass by metalorganic chemical vapor deposition using the continuous cooling process

Metalorganic chemical vapor deposition of ferroelectric PbTiO3 thin films in indium-tin-oxide-coated glass using Pb(tmhd)2, Ti(OC3H7)4, and N2O via pyrolysis with several methods was performed in order to produce PbTiO3 films with high-magnitude dielectric constants, a low dissipation factor, and high transmittance. Scanning electron microscopy showed that the surfaces of the PbTiO3 films grown by the continuous cooling process (CCP) had the best surface morphology. The stoichiometry of the PbTiO3 films was observed by Auger electron spectroscopy. Room-temperature current-voltage and capacitance-voltage (C-V) measurements clearly revealed a metal-insulator-metal behavior for the PbTiO3 insulators. The dielectric constant and the dissipation factor of the PbTiO3 thin film grown by the CCP determined at a frequency of 10 kHz were 156 and 0.015, respectively. Optical transmittance measurements showed that the PbTiO3 grown by the CCP had a transparency, which was approximately 85% of the transparency in the visible wavelength range. These results indicate that the PbTiO3 thin films grown on indium-tin-oxide-coated glass by CCP have promising applications as insulator films for thin film flat-panel-electroluminescent displays.