Title of article :
Analytical description of the film thickness distribution obtained by the pulsed laser ablation of a monoatomic target: application to silicon and germanium
Author/Authors :
F. Antoni، نويسنده , , C. Fuchs، نويسنده , , E. Fogarassy، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1996
Pages :
5
From page :
50
To page :
54
Abstract :
In this work, the spatial distribution of laser-generated species in vacuum from a monoatomic target is deduced from the analytical resolution of the hydrodynamic equations for a plasma expanding in the adiabatic regime. The thickness distribution of the laser deposited layers is demonstrated to be related to the initial dimensions of the plasma but independent of both the laser fluence and the atomic mass of the target element. From these calculations, we also deduced an angular distribution of the deposits as a sum of cosnθ. These theoretical results are experimentally supported in the specific case of the pulsed excimer laser ablation of Si and Ge monoatomic targets.
Journal title :
Applied Surface Science
Serial Year :
1996
Journal title :
Applied Surface Science
Record number :
990547
Link To Document :
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