Author/Authors :
P.E. Dyer، نويسنده , , S.R. Jackson، نويسنده , , P.H. Key، نويسنده , , W.J. Metheringham، نويسنده , , M.J.J. Schmidt، نويسنده ,
Abstract :
ArF laser ablation of Ti:sapphire (Ti:Al2O3) has been investigated as a potential means for micromachining this laser crystal and depositing thin layers for use as active waveguides. Plume spectra recorded for ablation in low pressure oxygen and a preliminary assessment of layers grown by this method are reported.
