Title of article :
XPS and AFM characterization of a vanadium oxide film on TiO2(100) surface
Author/Authors :
G. Chiarello، نويسنده , , R. Barberi b، نويسنده , , A. Amoddeo، نويسنده , , L.S. Caputi، نويسنده , , E. Colavita، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1996
Pages :
5
From page :
15
To page :
19
Abstract :
Vanadium oxide has been grown in ultra high vacuum onto a rutile TiO2(100) surface and studied by X-ray photoelectron spectroscopy and atomic force microscopy. The AFM image showed a surface with a peculiar roughness made of three-dimensional structures having an average height of 10 nm and an average base radius of about 100 nm.
Journal title :
Applied Surface Science
Serial Year :
1996
Journal title :
Applied Surface Science
Record number :
990698
Link To Document :
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