Author/Authors :
Tohru Nishibe، نويسنده , , Hiroshi Mitsuhashi، نويسنده , , Yuki Matsuura، نويسنده , , Yoshito Kawakyu، نويسنده ,
Abstract :
An approach to in situ characterization of polysilicon surfaces annealed by a XeCl excimer laser has been investigated by the UV reflectance method and atomic force microscopy which represents a nano-scale surface morphology. The features of the surface morphology were found to be closely connected to the performance of TFT devices.
