Title of article :
On the application of XPS to ceria films grown by MOCVD using a fluorinated precursor
Author/Authors :
D. Scholefield and D. Chadwick ، نويسنده , , J. McAleese، نويسنده , , K. Senkiw، نويسنده , , B.C.H. Steele، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1996
Pages :
4
From page :
417
To page :
420
Abstract :
MOCVD grown CeO2 films using the precursor Ce(fod)4 (where fod-H = 1,1,1,2,2,3,3-heptafluoro-7,7-dimethyloctane-3,5-dione) have been analysed by XPS. Residual fluorine was found to be in the form of fluoride and an organo-related fluorine species which converted rapidly to fluoride under application of the XPS technique. At the same time the CeO2 spectrum developed the presence of Ce3+. The rate of conversion was found to be sample dependent.
Journal title :
Applied Surface Science
Serial Year :
1996
Journal title :
Applied Surface Science
Record number :
990745
Link To Document :
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