Title of article :
The surface and interface reaction of metal thin film on sapphire substrate
Author/Authors :
H.J. Kang، نويسنده , , C.H. Kim، نويسنده , , N.S Park، نويسنده , , M.W. Kim، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1996
Pages :
5
From page :
160
To page :
164
Abstract :
The microscopic properties of the surface and interface reaction between active metals such as Ti, Zr and sapphire substrate have been studied using X-ray photoelectron spectroscopy (XPS). XPS results indicate that the submonolayer of titanium does not react with oxygen into sapphire at room temperature, but at about 1073 K titanium reduces the sapphire with the formation of TiO2 and metallic Al at the interface. But in the case of Zr, there is no tendency of any reaction at the interface with sapphire substrate even at high temperature. The result shows that Ti reacts more actively with sapphire than Zr does.
Journal title :
Applied Surface Science
Serial Year :
1996
Journal title :
Applied Surface Science
Record number :
990779
Link To Document :
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