Title of article
Photo-induced intersubband absorption in Si/Si1−xGex quantum wells
Author/Authors
P. Boucaud، نويسنده , , L. Wu، نويسنده , , F.H. Julien، نويسنده , , J.-M. Lourtioz، نويسنده , , I. Sagnes، نويسنده , , Y. Campidelli ، نويسنده , , P.-A. Badox، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1996
Pages
4
From page
342
To page
345
Abstract
We have investigated photo-induced intersubband absorption in the valence band of Si/SiGe quantum wells. Carriers are optically generated in the quantum wells using interband optical pumping. Both p- and s-polarized intersubband absorptions of 3 nm 30% SiGe multi-quantum wells are measured using a waveguide geometry. At normal incidence, the infrared modulation is surprisingly quenched around 10 μm. We show that this result can be interpreted by taking into account the Fabry-Perot reflections in the multi-quantum well stack and the anomalous dispersion associated with intersubband transitions. The intersubband absorption is found to be dependent on the interband excitation wavelength. This indicates that the s-polarized photo-induced absorptions which involve bound-to-bound and bound-to-continuum transitions are probably assisted by potential fluctuations linked to interface roughness.
Journal title
Applied Surface Science
Serial Year
1996
Journal title
Applied Surface Science
Record number
990946
Link To Document