Title of article
Characterization of hard amorphous carbon films deposited with high-energy ion beams
Author/Authors
R.G. Pregliasco، نويسنده , , G. Zampieri، نويسنده , , H. Huck، نويسنده , , E.B. Halac، نويسنده , , M.A.R. de Benyacar، نويسنده , , R. Righini، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1996
Pages
7
From page
261
To page
267
Abstract
We report a characterization of hard amorphous carbon films prepared by a new method: high-energy (ca. 30 keV) bombardment with CH3+ and CH4+ ions. The results of AES and EELS reveal that almost 60% of the atoms are in sp2 sites and are consistent with the hypothesis that the microscopic structure of the films consists of an intricate network of small amorphous graphite-like sheets connected by sp3-rich zones. Raman spectroscopy and SIMS results are also discussed.
Journal title
Applied Surface Science
Serial Year
1996
Journal title
Applied Surface Science
Record number
990994
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