Title of article
MOCVD growth of Ga2Se3 on GaAs(100) and GaP(100): a Raman study
Author/Authors
M. von der Emde، نويسنده , , D.R.T. Zahn، نويسنده , , T. Ng، نويسنده , , N. Maung، نويسنده , , G.H. Fan، نويسنده , , I.B. Poole، نويسنده , , Jo Williams، نويسنده , , A.C. Wright، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1996
Pages
5
From page
575
To page
579
Abstract
Due to its luminescence in the blue-green spectral range, Ga2Se3 has become a subject of extensive research. Thin epitaxial Ga2Se3 layers were grown on GaAs(100) and GaP(100) for the first time by metalorganic chemical vapour deposition (MOCVD). The structural and optical properties were investigated by transmission electron microscopy, Raman spectroscopy and photoluminescence (PL). Raman spectra were taken in a temperature range from 100 K to 600 K using excitation energies of Ar+ and Kr+ ion lasers. Additionally the photoluminescence of the layers was measured using ultraviolet (UV) excitation. The results of this study are compared and discussed with those of other growth techniques.
Journal title
Applied Surface Science
Serial Year
1996
Journal title
Applied Surface Science
Record number
991117
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