A low temperature system with a pulse UV laser for scribing HTSC films and single crystals

A simple laser scribing equipment used to pattern high-Tc films and single crystals within a micron accuracy is described. A focused beam of a UV pulsed laser serves as a cutting tool. A low temperature attachment enables all operations to be performed at sample temperatures ranging from 65 to 300 K. Thus it provides a means to fit the critical current of any element in a cryoelectronic circuit to a desirable value during its operational conditions.