Laser-assisted deposition of a-C:H at room temperature: experiment and theory

The laser-induced deposition of a-C:H on Si(100) substrates by photolytic dissociation of methylene-iodide is investigated. The near-UV multiline of an Ar+-laser in parallel configuration to the substrate surface is used to decompose the molecules. A model, based on experimentally observed recombination effects, has been developed to explain the features of the deposition process.