Epitaxial deposition of GaInN and InN using the rotating susceptor ALE system

The growth of GaInN ternary alloys has been investigated using atomic layer epitaxy. Single crystal films have been deposited at 100 Torr in the 600°C to 700°C temperature range using the rotating susceptor approach. The InN percentage in the deposited films were found to depend on more than just the gas phase In/Ga ratio. In addition to the relative indium to gallium composition of the precursor gases, the indium incorporation was also found to depend on the absolute partial pressures of the reactant gases. The indium incorporation increases with decreasing growth temperatures, and may reach a temperature dependent saturation limit for a given set of growth conditions. Optimization of the ALE growth process has resulted in single crystal films exhibiting band edge room temperature photoluminescence for InN percentages of up to 27% in the GaInN ternary films. In addition, single crystal indium nitride has been grown using the ALE technique at 480°C.