Author/Authors :
Jarmo I Skarp، نويسنده , , Pekka J Soininen، نويسنده , , Pekka T Soininen، نويسنده ,
Abstract :
An atomic layer epitaxy (ALE) reactor has been constructed for R&D purposes. This piece of equipment can handle up to 30×40 cm2 rectangular plates or 300 mm wafers as substrates. The basic functions of the reactor are described. ZnO and Al2O3 were used as test processes. Thickness variation of less than 2% has been obtained in both cases.
